Selected Publications By Date


 2009   2008   2007   2006   2005   2004   2003   2002   2001   2000   1999   1996   


            2009    (top)

      S.A. Fraser, A. Lyman, K. S. Mallon, J. Ting, C. J. Murphy, P. F. Nealey
       
The effect of nanoscale topography in compliant gels on corneal epithelial cell behaviors
        Biomaterials, (submitted), (2009)

        J. A. Last, S. J. Liliensiek, P. F. Nealey, C. J. Murphy
        Determining the mechanical properties of human corneal basement membranes with atomic force microscopy
        Journal of Structural Biology, 167(1), 19-24 (2009)

        S. J. Liliensiek, C. J. Murphy, P. F. Nealey
        Characterization of endothelial basement membrane nanotopography in rhesus macaque as a guide for vessel tissue engineering
        Tissue Engineering Part A, April, (2009)

        S. A. Morin, Y. H. La, C.-C. Liu, J. A. Streifer, R. J. Hamers, P. F. Nealey, S. Jin
        Assembly of nanocrystal arrays via block copolymer directed nucleation
        Angewandte Chemie International Edition, 48 (12), 2135-2139 (2009)

        J. H. Park, C.-C. Liu, M. K. Rathi, L. J. Mawst, P. F. Nealey, T. F. Kuech
        Nano-scale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nano-patterning
        Journal of Nanophotonics. 3(1), 031604 (2009)

        S. M. Park, G. S. W. Craig, C. -C. Liu, M. P. Stoykovich, Y.-H. La, N. J. Ferrier, P. F. Nealey
        Directed assembly and characterization of hexagonal order of P(S-b-MMA) cylinders on chemical patterns
        Macromolecules (in review), (2009).

        T. Porri, C. J. Murphy, P. F. Nealey
       
Cellular response to integrin- and syndecan-specific binding EG3-modified substrates
        Langmuir, (submitted), (2009)

        T. Porri, C. J. Murphy, P. F. Nealey
       
A flexible substrate containing basement membrane-like topographic features for cell culture
        Nanotechnology, (submitted), (2009)

        S. S. Soofi, J. A. Last, P. F. Nealey, C. J. Murphy
        The elastic modulus of MatrigelTM as determined by atomic force microscopy
        Journal of Structural Biology (in press), (2009).

        Y.-H. Ting, S. M. Park, C.-C. Liu, X. Liu, F. J. Himpsel, P. F. Nealey
       
Surface roughening of polystyrene and poly(methyl methacrylate) in Ar/O2 plasma etching
        Journal of Vacuum Science & Technology B, (submitted), (2009)
 

             2008    (top)

        Y. Chen, L. S. Melvin, M. M. Weislogel, R. M. Jenson, S. Dhuey, P. F. Nealey
        Design, fabrication, and testing of microporous wicking structure
        Microelectronic Engineering, 85(5-6), 1027-1030 (2008)

        K. C. Daoulas, M. Muller, M. P. Stoykovich, H. Kang, J. J. de Pablo, P. F. Nealey
       
Directed copolymer assembly on chemical substrate patterns: A phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the
        substrate pattern
       
Langmuir, 24(4), 1284-1295 (2008)

        F. A. Detcheverry, K. Daoulas, H. Kang, M. Muller, P. F. Nealey, J. J. de Pablo
       
Monte Carlo simulation of a coarse grain polymer nanocomposite model
       
Macromolecules, 41(13), 4989-5001 (2008)

        M. Y. Efmerov, A. V. Kiyanova, P. F. Nealey
        Temperature-modulated ellipsometry: A new probe for glass transition in thin supported polymer films
        Macromolecules, 41(16), 5978-5980 (2008)

        M. Y. Efremov, S. S. Soofi, A. V. Kiyanova, C. J. Munoz, P. Burgardt, F. Cerrina, P. F. Nealey
       
Vacuum ellipsometry as a method for probing glass transition in thin polymer films
       
Review of Scientific Instruments, 79, 043903 (2008)

        S. A. Fraser, Y. -H. Ting, A. E. Wendt, C. J. Murphy, P. F. Nealey
       
Sub-micron and nanoscale feature depth modulates alignment of stromal fibroblasts and corneal epithelial cells in serum rich and serum free media
       
Journal of Biomedical Materials Research: Part A, 86A(3), 725-735 (2008)

        E. Han, K. O. Stuen, Y.-H. La, P. F. Nealey, P. Gopalan
       
Effect of composition of substrate-modifying random copolymers on the orientation of symmetric and asymmetric diblock copolymer domains
       
Macromolecules, 41(23), 9090-9097 (2008)

        S. Ji, C.-C. Liu, J. G. Son, K. Gotrik, G. S. W. Craig, P. Gopalan, F. J. Himpsel, K. Char, P. F. Nealey
        Generalization of the use of random copolymers to control the wetting behavior of block copolymer films
        Macromolecules, 41(23), 9098-9103 (2008)

        S. Ji, G. Liu, F. Zheng, G. S. W. Craig, F. J. Himpsel, P. F. Nealey
       
Preparation of neutral wetting brushes for block copolymer films from homopolymer blends
       
Advanced Materials, 20(16), 3054-3060 (2008)

        H. Kang, G. S. W. Craig, P. F. Nealey
        Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern
        Journal of Vacuum Science & Technology B, 26(6), 2495-2499 (2008)

        H. Kang, F. A. Detcheverry, A. N. Mangham, M. P. Stoykovich, K. C. Daoulas, R.J. Hamers, M. Muller, J. J. de Pablo, P. F. Nealey
       
Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites
       
Physical Review Letters, 100, 148303 (2008)

        N. W. Karuri, P. F. Nealey, C. J. Murphy, R. M. Albrecht
        Structural organization of the cytoskeleton in SV40 human corneal epithelial cells cultured on nano- and microscale topography
        Scanning, 30(5), 405-413 (2008)

        S. M. Park, G. S. W. Craig, Y. H. La, P. F. Nealey
        Morphological reconstruction and ordering in films of sphere-forming block copolymers on striped chemically patterned surfaces
        Macromolecules, 41(23), 9124-9129 (2008)

        S. M. Park, G. S. W. Craig, C.-C. Liu, Y. H. La, N. J. Ferrier, P. F. Nealey
        Characterization of cylinder-forming block copolymers directed to assemble on spotted chemical patterns
        Macromolecules, 41(23), 9118-9123 (2008)

        R. Ruiz, H. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Albrecht, J. J. de Pablo, P. F. Nealey
       
Density Multiplication and improved lithography by directed block copolymer assembly
       
Science, 321(5891), 936-939 (2008)

        P. Russell, J. Z. Gasiorowski, P. F. Nealey, C. J. Murphy
        Response of human trabecular meshwork cells to topographic cues on the nanoscale level
        Investigative Ophthalmology & Visual Science, 49(2), 629-635 (2008).

        J. G. Son, X. Bulliard, H. Kang, P. F. Nealey, K. Char
       
Surfactant-assisted orientation of thin diblock copolymer films
       
Advanced Materials, 20(19), 3643-3648 (2008)

        M. P. Stoykovich, K. Yoshimoto, P. F. Nealey
       
Mechanical properties of polymer nanostructures: measurements based on deformation in response to capillary forces
       
Applied Physics A: Materials Science & Processing, 90(2), 277-283 (2008)

        K. O. Stuen, C.-C. Liu, A. M. Welander, G. Liu, J. J. de Pablo, P. F. Nealey
       
In situ characterization of block copolymer ordering on chemically nanopatterned surfaces by time-resolved SAXS
       
Journal of Vacuum Science & Technology B, 26(6), 2504-2508 (2008)

        Y.-H. Ting, S. M. Park, C.-C. Liu, X. Liu, F. J. Himpsel, P. F. Nealey
       
Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography
       
Journal of Vacuum Science & Technology B, 26(5), 1684-1689 (2008)

        A. M. Welander, P. F. Nealey, H. Cao, R. Bristol
        Impact of trench width roughness on the graphoepitaxial assembly of block copolymers
        Journal of Vacuum Science & Technology B, 26(6), 2484-2488 (2008)

        A. M. Welander, K. O. Stuen, H. Kang, H. H. Solak, M. Muller, J. J. de Pablo, P. F. Nealey
       
Rapid directed assembly of block copolymer films at elevated temperatures
       
Macromolecules, 41(8), 2759-2761 (2008)
 

            2007    (top)

        W. Cheng, R. Sainidou, P. Burgardt, N. Stefanou, A. V. Kiyanova, M. Y. Efremov, G. Fytas, P. F. Nealey
       
Elastic properties and glass transition of supported polymer thin films
       
Macromolecules, 40(20), 7283-7290 (2007)

        G. S. W. Craig, P. F. Nealey
       
Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools  
       
Journal of Vacuum Science & Technology B, 25(6), 1969-1975 (2007)

        G. S. W. Craig, P. F. Nealey  
       
Self-assembly of block copolymers on lithographically defined nanopatterned substrates
       
Journal of Photopolymer Science and Technology, 20(4), 511-517 (2007)

        E. W. Edwards, M. Muller, M. P. Stoykovich, H. H. Solak, J. J. de Pablo, P. F. Nealey
       
Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates
       
Macromolecules, 40(1), 90-96 (2007)

        Y. Ekinci, H. H. Solak, C. Padeste, J. Gobrect, M. P. Stoykovich, P. F. Nealey
       
20 nm Line/space patterns in HSQ fabricated by EUV interference lithography
       
Microelectronic Engineering, 84(5-8), 700-704 (2007)

        E. Han, I. In, S. M. Park, Y. H. La, Y. Wang, P. F. Nealey, P. Gopalan
       
Photopatternable imaging layers for controlling block copolymer microdomain orientation
       
Advanced Materials, 19(24), 4448-4452 (2007)

        H. R. Keymeulen, A. Diaz, H. H. Solak, C. David, F. Pfeiffer, B. D. Patterson, J. F. van der Veen, M. P. Stoykovich, P. F. Nealey
       
Measurement of the x-ray dose-dependent glass transition temperature of structured polymer films by x-ray diffraction
       
Journal of Applied Physics, 102, 013528 (2007)

      Y. H. La, I. In, S. M. Park, R. P. Meagley, M. Leolukman, P. Gopalan, P. F. Nealey
       
Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness
       
Journal of Vacuum Science & Technology B, 25(6), 2508-2513 (2007)

        Y. H. La, M. P. Stoykovich, S. M. Park, P. F. Nealey
       
Directed assembly of cylinder-forming block copolymers into patterned structures to fabricate arrays of spherical domains and nanoparticles
       
Chemistry of Materials, 19(18), 4538-4544 (2007)

        C.-C. Liu, P. F. Nealey, Y. H. Ting, A. E. Wendt
       
Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching
       
Journal of Vacuum Science & Technology B, 25(6), 1963-1986 (2007)

        G. J. Papakonstantopoulos, M. Doxastakis, P. F. Nealey, J. L. Barrat, J. J. de Pablo
       
Calculation of local mechanical properties of filled polymers
       
Physical Review E, 75, 031803 (2007)

        J. H. Park, A. A. Khandekar, S. M. Park, L. J. Mawst, T. F. Kuech, P. F. Nealey
       
Selective GaAs quantum dot array growth using dielectric and AlGaAs masks pattern-transferred from diblock copolymer
       
Materials Research Symposium Proceedings, San Francisco, CA, 1014, AA07-15 (2007)

        J. H. Park, A. A. Khandekar, S. M. Park, L. J. Mawst, T. F. Kuech, P. F. Nealey
       
Selective GaAs quantum dot array growth using diblock copolymer nanopatterning
       
Electronic Materials Conference, University of Notre Dame, ID, (2007)

        S. M. Park, G. S. W. Craig, Y. H. La, H. H. Solak, P. F. Nealey       
       
Square arrays of vertical cylinders of PS-b-PMMA on chemically nanopatterned surfaces
       
Macromolecules, 40(14), 5084-5094 (2007)

        S. M. Park, P. Ravindran, Y. H. La, G. S. W. Craig, N. J. Ferrier, P. F. Nealey
       
Combinatorial generation and replication-directed assembly of complex and varied geometries with thin films of diblock copolymers
       
Langmuir, 23(17), 9037-9045 (2007)

        S.M. Park, M. P. Stoykovich, R. Ruiz, Y. Zhang, C. T. Black, P. F. Nealey
        Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates
       
Advanced Materials, 19(4), 607-611 (2007)

        M. P. Stoykovich, H. Kang, K. Daoulas, G. Liu, C.-C. Liu, J. J. de Pablo, M. Muller, P. F. Nealey
       
Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries
       
ACS Nano, 1(3), 168-175 (2007)

        K. O. Stuen, I. In, E. Han, J. A. Streifer, R. J. Hamers, P. F. Nealey, P. Gopalan
       
Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular
        weight
       
Journal of Vacuum Science & Technology B, 25(6), 1958-1962 (2007)

         J. Wallace, Y. C. Cheng, A. Isoyan, Q. Leonard, M. Fisher, M. Green, J. Bisognano, P. F. Nealey, F. Cerrina
       
A novel EUV exposure station for nanotechnology studies
       
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 582(1), 254-257 (2007)
 

             2006    (top)

        A. Charrier, T. J. Porri, C. J. Murphy, P. F. Nealey
       
A new method to characterize chemically and topographically nanopatterned surfaces
       
Journal of Biotechnology, 126(2), 196-204 (2006)

        W. Cheng, G. Fytas, A. V. Kiyanova, M. Y. Efremov, P. F. Nealey
        Submicron polymer gratings: Optical diffraction and spontaneous brillouin scattering
        Macromolecular Rapid Communications, 27(9), 702 (2006)

        K. C. Daoulas, M. Muller, J. J. de Pablo, P. F. Nealey, G. D. Smith
        Morphology of multi-component polymer systems: single chain in mean field simulation studies
        Soft Matter, 2(7), 573-583 (2006)

        K. C. Daoulas, M. Muller, M. P. Stoykovich, Y. J. Papakonstantopoulos, J. J. de Pablo, P. F. Nealey, S. M. Park, H. H. Solak
        Directed assembly of copolymer materials on patterned substrates: Balance of simple symmetries in complex structures
       
Journal of Polymer Science Part B: Polymer Physics, 44(18), 2589-2604 (2006)

        K. C. Daoulas, M. Muller, M. P. Stoykovich, S. M Park, Y. J. Papakonstantopoulos, J. J. De Pablo, P. F. Nealey, H. H. Solak
        Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched
        symmetry
        Physical Review Letters, 96, 036104 (2006)

        E. Edwards, M. P. Stoykovich, P. F. Nealey, H. H. Solak
        Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films
        Journal of Vacuum Science and Technology B, 24(1), 240 (2006)

        E. W. Edwards, M. P. Stoykovich, H. H. Solak, P. F. Nealey
        Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces
        Macromolecules, 39(10), 3598 (2006)

        I. In, Y. H. La, S. M. Park, P. F. Nealey, P. Gopalan
        Side-chain-grafted random copolymer brushes as neutral surfaces for controlling the orientation of block copolymer microdomains in thin films
        Langmuir, 22(18), 7855 (2006)

        N. W. Karuri, T. J. Porri, R. M. Albrecht, C. J. Murphy, P. F. Nealey
       
Nano- and microscale holes modulate cell-substrate adhesion, cytoskeletal organization, and -beta 1 integrin localization in SV40 human corneal epithelial cells
       
IEEE Transactions on Nanobioscience, 5(4), 273-280 (2006)

        S. O. Kim, B. H. Kim, K. Kim, C. M. Koo, M. P. Stoykovich, P. F. Nealey, H. H. Solak
        Defect structure in thin films of a lamellar block copolymer self-assembled on neutral homogeneous and chemically nanopatterned surfaces
        Macromolecules, 39(16), 5466 (2006)

        S. J. Liliensiek, S. Campbell, P. F. Nealey, C. J. Murphy
        The scale of substratum topographic features modulates proliferation of corneal epithelial cells and corneal fibroblasts
       
Journal of Biomedical Materials Research Part A, 79A(1), 185-192 (2006)   

        S. J. Liliensiek, K. Schell, E. Howard, P. F. Nealey, C. J. Murphy
        Cell sorting but not serum starvation is effective for SV40 human corneal epithelial cell cycle synchronization
        Experimental Eye Research, 83(1), 61-68 (2006)

        J. H. Park, A. A. Khandekar, S. M. Park, L. J. Mawst, T. F. Kuech, P. F. Nealey
        Selective growth and characterization of GaAs quantum dots on patterned substrate by utilizing diblock copolymer template
        TMS Electronic Materials Conference, PA, (2006)

        J. H. Park, A. A. Khandekar, S. M. Park, L. J. Mawst, T. F. Kuech, P. F. Nealey
       
Selective MOCVD growth of single-crystal dense GaAs quantum dot array using cylinder-forming diblock copolymers
       
Journal of Crystal Growth, 297(2), 283-288 (2006)

        M. P. Stoykovich, E. W. Edwards, H. H. Solak, P. F. Nealey
        Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces
       
Physical Review Letters, 97, 147802 (2006)
 
        M. P. Stoykovich, P. F. Nealey
        Block copolymers and conventional lithography
       
Materials Today, 9(9), 20-29 (2006)

        A. I. Teixeira, G. A. McKie, J. D. Foley, P. J. Bertics, P. F. Nealey, C. J. Murphy
        The effect of environmental factors on the response of human corneal epithelial cells to nanoscale substrate topography
        Biomaterials, 27(21), 3945 (2006)
         2005  (top)

        K. A. Diehl, J. D. Foley, P. F. Nealey, C. J. Murphy
        Nanoscale topography modulates corneal epithelial cell migration
        Journal of Biomedical Materials Research Part A, 75A(3), 603 (2005)

        E. W. Edwards, M. P. Stoykovich, M. Muller, H. H. Solak, J. J. De Pablo, P. F. Nealey
        Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates
        Journal of Polymer Science Part B: Polymer Physics, 43(23), 3444 (2005)

        E. E. Endler, P. F. Nealey, J. Yin
        Fidelity of micropatterned cell cultures
        Journal of Biomedical Materials Research Part A, 74A(1), 92-103 (2005)

        J. D. Foley, E. W. Grunwald, P. F. Nealey, C. J. Murphy
        Cooperative modulation of neuritogenesis by PC12 cells by topography and nerve growth factor

        Biomaterials, 26(17), 3639 (2005)

        K. E. Gonsalves, M. Thiyagarajan, J. H. Choi, P. Zimmerman, F. Cerrina, P. Nealey, V. Golovkina, J. Wallace, N. Batina
        High performance resist for EUV lithography

        Microelectronic Engineering, 77(1), 27 (2005)

        I. Junarsa, M. P. Stoykovich, P. F. Nealey, Y. S. Ma, F. Cerrina
       
Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
       
Journal of Vacuum Science and Technology B, 23(1), 138 (2005)      

        Y. H. La, E. W. Edwards, S. M. Park, P. F. Nealey
        Directed assembly of cylinder-forming block copolymer films and thermochemically induced cylinder to sphere transition: A hierarchical route to linear arrays of nanodots
        Nano Letters, 5(7), 1379-1384 (2005)

        P. F. Nealey
        Self-assembling nanostructures in free-form designs
        Advanced Engineering Materials, 7(5), 275 (2005)

        G. J. Papakonstantopoulos, K. Yoshimoto, M. Doxastakis, P. F. Nealey, J. J. de Pablo
        Local mechanical properties of polymeric nanocomposites
        Physical Review E, 72(3), 031801 (2005)

        M. P. Stoykovich, M. Muller, S. O. Kim, H. H. Solak, E. W. Edwards, J. J. de Pablo, P. F. Nealey   
        Directed assembly of block copolymer blends into nonregular device-oriented structures
        Science, 308(5727) 1442-1446 (2005)

        S. G. Xiao, X. M. Yang, E. W. Edwards, Y. H. La, P. F. Nealey
        Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays
        Nanotechnology, 16(7), S324 (2005)

        K. Yoshimoto, T. S. Jain, P. F. Nealey, J. J. de Pablo
        Local dynamic mechanical properties in model free-standing polymer thin films
      Journal of Chemical Physics, 122(14), 144712 (2005)
 

2004  (top)
 
        E. W. Edwards, M. F. Montague, H. H. Solak, C. J. Hawker, P. F. Nealey
        Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates
        Advanced Materials, 16(15), 1315-1319 (2004)

        V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, J. Gobrecht
        Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography

        Journal of Vacuum Science and Technology B, 22(1), 99 (2004)

        F. J. Himpsel, J. L. McChesney, J. N. Crain, A. Kirakosian, V. Perez-Dieste, N. L. Abbott, Y. Y. Luk, P. F. Nealey, D. Y. Petrovykh
        Stepped silicon surfaces as templates for one-dimensional nanostructures

        Journal of Physical Chemistry B, 108(38), 14484 (2004)

        I. Junarsa, P. F. Nealey
        Fabrication of masters for nanoimprint, step and flash, and soft lithography using hydrogen silsesquioxane and x-ray lithography

        Journal of Vacuum Science and Technology B, 22(6), 2685 (2004)

        N. W. Karuri, S. Liliensiek, A. I. Teixeira, G. Abrams, S. Campbell, P. F. Nealey, C. J. Murphy
        Biological length scale topography enhances cell-substratum adhesion of human corneal epithelial cells

        Journal of Cell Science, 117(15), 3153 (2004)

        A. R. Pawloski, P. F. Nealey
        Useful protocol for evaluating subtle and important differences between photoresist formulations

        Journal of Vacuum Science and Technology B, 22(3), 869 (2004)

        A. I. Teixeira, P. F. Nealey, C. J. Murphy
        Responses of human keratocytes to micro- and nanostructured substrates

        Journal of Biomedical Materials Research Part A, 71A(3), 369 (2004)

        K. Yoshimoto, T. S. Jain. K. van Workum, P. F. Nealey, J. J. de Pablo
        Mechanical heterogeneities in model polymer glasses at small length scales

        Physical Review Letters, 93(17), 175501 (2004)

        K. Yoshimoto, M. P. Stoykovich, H. B. Cao, J. J. de Pablo, P. F. Nealey, W. J. Drugan
        A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties

        Journal of Applied Physics, 96(4), 1857 (2004)
 

2003  (top)
 
          G. A. Abrams, C. J. Murphy, Z. Y. Wang, P. F. Nealey, D. E. Bjorling
          Ultrastructural basement membrane topography of the bladder epithelium
          Urological Research, 31(5), 341 (2003)
 
          M. P. Stoykovich, H. B. Cao, K. Yoshimoto, L. E. Ocola, P. F. Nealey
          Deformation of nanoscopic polymer structures in response to well-defined capillary forces
          Advanced Materials, 15(14), 1180 (2003)
 
          S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey
          Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
          Nature, 424(6947), 411-414 (2003)
 
          H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S. O. Kim, P. F. Nealey
          Sub-50 nm period patterns with EUV interference lithography
          Microelectronic Engineering, 67, 56 (2003)
 
          Q. Wang, P. F. Nealey, J. J. de Pablo
          Behavior of single nanoparticle/homopolymer chain in ordered structures of diblock copolymers
          Journal of Chemical Physics, 118(24), 11278 (2003)
 
          A. I. Teixeira, G. A. Abrams, P. J. Bertics, C. J. Murphy, P. F. Nealey
          Epithelial contact guidance on well-defined micro- and nanostructured substrates
          Journal of Cell Science, 116(10), 1881 (2003)
 
          A. I. Teixeira, G. A. Abrams, C. J. Murphy, P. F. Nealey
          Cell behavior on lithographically defined nanostructured substrates
          Journal of Vacuum Science and Technology B, 21(2), 683 (2003)
 
          Q. Wang, P. F. Nealey, J. J. de Pablo
          Simulations of the morphology of cylinder-forming asymmetric diblock copolymer thin films on nanopatterned substrates
          Macromolecules, 36(5), 1731 (2003)
 
          E. E. Endler, K. A. Duca, P. F. Nealey, G. M. Whitesides, J. Yin
          Propagation of viruses on micropatterned host cells
          Biotechnology and Bioengineering, 81(6), 719 (2003)
 
 
2002  (top)
 
          A. R. Pawloski, P. F. Nealey, W. Conley
          Efficiency of photoacid generators in chemically amplified resists for 157 nm lithography
          Journal of Photopolymer Science and Technology, 15(5), 731 (2002)
 
          A. R. Pawloski, P. F. Nealey
          Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists
          Journal of Vacuum Science and Technology B, 20(6), 2413-2420 (2002)
 
          Q. Wang, P. F. Nealey, J. J. de Pablo
          Lamellar structures of symmetric diblock copolymers: Comparisons between lattice Monte Carlo simulations and self-consistent mean-field calculations
          Macromolecules, 35(25), 9563 (2002)
 
          S. R. Kim, A. I. Teixeira, P. F. Nealey, A. E. Wendt, N. L. Abbott
          Fabrication of polymeric substrates with well-defined nanometer-scale topography and tailored surface chemistry
          Advanced Materials, 14(20), 1468 (2002)
 
          A. R. Pawloski, Christian, P. F. Nealey
          The multifunctional role of base quenchers in chemically amplified photoresists
          Chemistry of Materials, 14(10), 4192 (2002)
 
          A. R. Pawloski, Christian, P. F. Nealey
          Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists
          Journal of Vacuum Science and Technology B, 30(5), 2162 (2002).
 
          G. A. Abrams, E. Bentley, P. F. Nealey, C. J. Murphy
          Electron microscopy of the canine corneal basement membranes
          Cells Tissues Organs, 140(4), 251 (2002)
 
          X. M. Yang, R. D. Peters, P. F. Nealey
          Imaging the substrate/film interface of thin films of diblock copolymers on chemically patterned surfaces
          Macromolecules, 35(6), 2406 (2002)
 
          R. D. Peters, X. M. Yang, P. F. Nealey
          Morphology of thin films of diblock copolymers on surfaces micropatterned with regions of different interfacial energy
          Macromolecules, 35(5), 1822 (2002)
 
          R. D. Peters, P. F. Nealey, J. N. Crain, F. J. Himpsel
          A near edge X-ray absorption fine structure spectroscopy investigation of the structure of self-assembled films of octadecyltrichlorosilane
          Langmuir, 18(4), 1250 (2002)
 
 
2001  (top)
 
          R. S. Tate, D. S. Fryer, S. Pasqualini, M. F. Montague, J. J. de Pablo, P. F. Nealey
          Extraordinary elevation of the glass transition temperature of thin polymer films grafted to silicon oxide substrates
          Journal of Chemical Physics, 115(21), 9982 (2001)
 
          A. R. Pawloski, Christian, P. F. Nealey
          A standard addition technique to quantify photoacid generation in chemically amplified photoresist
          Chemistry of Materials, 13(11), 4154 (2001)

 
          D. S. Fryer, R. D. Peters, E. J. Kim, J. E. Tomaszewski, J. J. de Pablo, P. F. Nealey, C. C. White, W. L. Wu
          Dependence of the glass transition temperature of polymer films on interfacial energy and thickness
          Macromolecules, 34(16), 5627 (2001)
 
          Q. Wang, P. F. Nealey, J. J. de Pablo
          Monte Carlo simulations of asymmetric diblock copolymer thin films confined between two homogeneous surfaces
          Macromolecules, 34(10), 3458 (2001)
 
          D. L. Goldfarb, J. J. de Pablo, P. F. Nealey, J. P. Simons, W. M. Moreau, M. Angelopoulos
          Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse [J. Vac. Sci. Technol. B 18, 3313 (2000)]
          Journal of Vacuum Science and Technology B., 19(2), 600 (2001)
 
          S. C. Clear, P. F. Nealey
          The effect of chain density on the frictional behavior of surfaces modified with alkylsiloxanes and immersed in n-alcohols
          Journal of Chemical Physics, 114(6), 2802 (2001)
 
          S. C. Clear, P. F. Nealey.
          Lateral force microscopy study of the frictional behavior of self-assembled monolayers of octadecyltrichlorosilane on silicon/silicon dioxide immersed in n-alcohols
          Langmuir, 17(3), 720 (2001)
 
          X. M. Yang, R. D. Peters, T. K. Kim, P. F. Nealey, S. L. Brandow, M. S. Chen, L. M. Shirey, W. J. Dressick.
          Proximity X-ray lithography using self-assembled alkylsiloxane films: Resolution and pattern transfer
          Langmuir, 17(1), 228 (2001)
 
 
2000  (top)
 
          X. M. Yang, R. D. Peters, P. F. Nealey, H. H. Solak, F. Cerrina
          Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates
          Macromolecules, 33(26), 9575 (2000)
 
          H. B. Cao, P. F. Nealey, W. D. Domke.
          Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms
          Journal of Vacuum Science and Technology B, 18(6), 3303 (2000)
 
          D. L. Goldfarb, J. J. de Pablo, P. F. Nealey, J. P. Simons, W. M. Moreau, M. Angelopoulos
          Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
          Journal of Vacuum Science and Technology B, 18(6), 3313 (2000)
 
          D. S. Fryer, P. F. Nealey, J. J. de Pablo
          Scaling of T-g and reaction rate with film thickness in photoresist: A thermal probe study
          Journal of Vacuum Science and Technology B, 18(6), 3376 (2000)
 
          M. M. Chauhan, P. F. Nealey.
          Outgassing of photoresists in extreme ultraviolet lithography
          Journal of Vacuum Science and Technology B, 18(6), 3402 (2000)
 
          R. D. Peters, X. M. Yang, Q. Wang, J. J. de Pablo, P. F. Nealey
          Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication
          Journal of Vacuum Science and Technology B, 18(6), 3530 (2000)
 
          R. D. Peters, X. M. Yang, T. K. Kim, P. F. Nealey
          Wetting behavior of block copolymers on self assembled films of alkylchlorosiloxanes: Effect of grafting density
          Langmuir, 16(24), 9620 (2000)
 
          M. Franco, P. F. Nealey, S. Campbell, A. I. Teixeira, C. J. Murphy
          Adhesion and proliferation of corneal epithelial cells on self-assembled monolayers
          Journal of Biomedical Materials Research Part A, 52(2), 261 (2000)
 
          A. J. Black, P. F. Nealey, J. H. Thywissen, M. Deshpande, N. El-Zein, G. N. Maracas, M. Prentiss, G. M. Whitesides
          Microfabrication of two layer structures of electrically isolated wires using self-assembly to guide the deposition of insulating organic polymer
          Sensors and Actuators A: Physical, 86(1-2), 96-102 (2000)
 
           J. A. Torres, P. F. Nealey, J. J. de Pablo
           Molecular simulation of ultrathin polymeric films near the glass transition
           Physical Review Letters, 85(15), 3221 (2000)
 
           D. S. Fryer, P. F. Nealey, J. J. de Pablo
           Thermal probe measurements of the glass transition temperature for ultrathin polymer films as a function of thickness
           Macromolecules, 33(17), 6439 (2000)
 
           T. K. Kim, X. M. Yang, R. D. Peters, B. H. Sohn, P. F. Nealey
           Chemical modification of self-assembled monolayers by exposure to soft X-rays in air
           Journal of Physical Chemistry B, 104(31), 7403 (2000)
 
           Q. Wang, Q. L. Yan, P. F. Nealey, J. J. de Pablo
           Monte Carlo simulations of diblock copolymer thin films confined between chemically heterogeneous hard surfaces
           Macromolecules, 33(12), 4512 (2000)
 
           Q. Wang, S. K. Nath, M. D. Graham, P. F. Nealey, J. J. de Pablo
           Symmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theory
           Journal of Chemical Physics, 112(22), 9996-10010 (2000)
 
           R. D. Peters, X. M. Yang, T. K. Kim, B. H. Sohn, P. F. Nealey
           Using self-assembled monolayers exposed to X-rays to control the wetting behavior of thin films of diblock copolymers
           Langmuir, 16(10), 4625 (2000)
 
           Q. Wang, Q. L. Yan, P. F. Nealey, J. J. de Pablo
           Monte Carlo simulations of diblock copolymer thin films confined between two homogeneous surfaces
           Journal of Chemical Physics, 112(1), 450-464 (2000)
 
           G. A. Abrams, S. S. Schaus, S. L. Goodman, P. F. Nealey, C. J. Murphy
           Nanoscale topography of the corneal epithelial basement membrane and Descemet's membrane of the human
           Cornea, 19(1), 57 (2000)
 
           G. A. Abrams, S. L. Goodman, P. F. Nealey, M. Franco, C. J. Murphy
           Nanoscale topography of the basement membrane underlying the corneal epithelium of the rhesus macaque
           Cell Tissue Research, 299(1), 39 (2000)
 
 
1999  (top)
 
           X. M. Yang, R. D. Peters, T. K. Kim, P. F. Nealey
           Patterning of self-assembled monolayers with lateral dimensions of 0.15 μm using advanced lithography
           Journal of Vacuum Science and Technology B, 17(6), 3203 (1999)
 
           D. S. Fryer, S. Bollepali, J. J. de Pablo, P. F. Nealey
           Study of acid diffusion in resist near the glass transition temperature
           Journal of Vacuum Science and Technology B, 17(6), 3351 (1999)
 
           C. R. Szmanda, R. L. Brainard, J. F. Mackevich, A. Awaji, T. Tanaka, Y. Yamada, J. Bohland, S. Tedesco, B. Dal'Zotto, W. Bruenger, M. Torkler, W. Fallmann, H. Loeschner, R.
           Kaesmaier, P. F. Nealey, A. R. Pawloski
           Measuring acid generation efficiency in chemically amplified resists with all three beams
           Journal of Vacuum Science and Technology B, 17(6), 3356 (1999)
 
           A. R. Pawloski, J. A. Torres, P. F. Nealey, J. J. de Pablo
           Applications of molecular modeling in nanolithography
           Journal of Vacuum Science and Technology B, 17(6), 3371 (1999)
 
           H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, P. F. Nealey
           Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography
           Applied Physics Letters, 75(15), 2328 (1999)
 
           S. C. Clear, P. F. Nealey
           Chemical force microscopy study of adhesion and friction between surfaces functionalized with self-assembled monolayers and immersed in solvents
           Journal of Colloid and Interface Science, 213(1), 238 (1999)
 
           S. K. Nath, P. F. Nealey, J. J. de Pablo
           Density functional theory of molecular structure for thin diblock copolymer films on chemically heterogeneous surfaces
           Journal of Chemical Physics, 110(15), 7483 (1999)
 
           R. G. Flemming, C. J. Murphy, G. A. Abrams, S. L. Goodman, P. F. Nealey
           Effects of synthetic micro- and nano-structured surfaces on cell behavior
           Biomaterials, 20(6), 573 (1999)
 
 
1996  (top)
 
           L. E. Ocola, D. Fryer, P. F. Nealey, J. J. de Pablo, F. Cerrina, S. Kammer
           Latent image formation: Nanoscale topography and calorimetric measurements in chemically amplified resists
           Journal of Vacuum Science and Technology B, 14(6), 3974 (1996)